1132-半導體製程-23055

報名期間：從 即日起 到 無限期
上課期間：從 2025-02-17 到 2025-06-30

• L1- Introduction
• L2 - clean room and wafer clean
• L3 - Crystal growth and epitaxy
• L4 - Photolithography(I)
• L4 - Photolithography(II)
• L4 - Photolithography(III)
• L4 - Photolithography(IV)
• L5 - Oxidation and thermal process(I)
• L5 - Oxidation and thermal process(II)
• L6 - Etch Basics and Wet etching