1131-半導體製程基礎-23039

報名期間：從 即日起 到 無限期
上課期間：從 2024-09-08 到 2025-01-31

• L1- Introduction
• L2 - clean room and wafer clean
• L3 - Crystal growth and epitaxy (I)
• L3 - Crystal growth and epitaxy((II)
• L4 - Photolithography(I)
• L4 - Photolithography(II)
• L4 - Photolithography(III)
• L4 - Photolithography(IV)
• L5 - oxidation and thermal process(I)
• L5 - oxidation and thermal process(II)
• L6 - Etch Basics and Wet etching
• L8 - Plasma Basic and Dry Etching(I)